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Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process

<Abstrate>

In the present state of the art, ion beam sputtering is

used to produce low-loss dielectric optics. During the

manufacturing of a dielectric layer stack, the deposition

material must be changed, which requires rapid

mechanical movement of vacuum components. These

mechanical components can be regarded as a risk

factor for contamination during the coating process,

which limits the quality of high-end laser components.

To minimize the particle contamination, we present a

novel deposition concept that does not require movable

components to change the coating material during the

coating process. A magnetic field guiding technique

has been developed, which enables the tuning of the

refractive index in the layer structure by sputtering

mixtures with varying compositions of two materials

using a single-ion source. The versatility of this new

concept is demonstrated for a high-reflection mirror.

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