Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process
<Abstrate>
In the present state of the art, ion beam sputtering is
used to produce low-loss dielectric optics. During the
manufacturing of a dielectric layer stack, the deposition
material must be changed, which requires rapid
mechanical movement of vacuum components. These
mechanical components can be regarded as a risk
factor for contamination during the coating process,
which limits the quality of high-end laser components.
To minimize the particle contamination, we present a
novel deposition concept that does not require movable
components to change the coating material during the
coating process. A magnetic field guiding technique
has been developed, which enables the tuning of the
refractive index in the layer structure by sputtering
mixtures with varying compositions of two materials
using a single-ion source. The versatility of this new
concept is demonstrated for a high-reflection mirror.