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Nanoporous polystyrene prepared via the selective removal of the low Mw component in polystyrene blends

<Abstrate>

Herein, we report a straightforward technique for the creation of

nanoporous polystyrene (PS) films. By preparing PS blend samples

with Mws of 600000 and 600gmol−1 followed by rinsing with

n-heptane, the low Mw component was dissolved and removed to

afford a low-density network of high Mw PS. Nanoscale pores are

formed as a result of the miscibility and stability of the initial state.

The resulting materials were characterized using ellipsometry,

atomic force microscopy and scanning electron microscopy.

Materials with an effective refractive index as low as 1.1 can be

prepared using this approach. The effects of varying the size of the

low Mw polymer and the application of low friction surfaces

prepared with the nanoporous samples were investigated.

<全文連結>

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