Nanoporous polystyrene prepared via the selective removal of the low Mw component in polystyrene blends
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Herein, we report a straightforward technique for the creation of
nanoporous polystyrene (PS) films. By preparing PS blend samples
with Mws of 600 000 and 600 g mol−1 followed by rinsing with
n-heptane, the low Mw component was dissolved and removed to
afford a low-density network of high Mw PS. Nanoscale pores are
formed as a result of the miscibility and stability of the initial state.
The resulting materials were characterized using ellipsometry,
atomic force microscopy and scanning electron microscopy.
Materials with an effective refractive index as low as 1.1 can be
prepared using this approach. The effects of varying the size of the
low Mw polymer and the application of low friction surfaces
prepared with the nanoporous samples were investigated.