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Electromigration-induced growth mode transition of anodic Cu6Sn5 grains in Cu|SnAg3.0Cu0.5|Cu lap-type interconnects

<Abstrate>

The rapid accumulation of the Cu6Sn5 phase at the anode is one of the major

electromigration-induced phenomena characterizing solder interconnections;

however, the outcome of the growth mode has always been conflated with that

of thermomigration. In this work, after the effects of the non-uniform thermal

distribution of the Cu|SnAg3.0Cu0.5|Cu lap-type joints are decoupled from the

influence of the current stress, the microstructural evolution of the anodic

Cu6Sn5 grains is studied under an average current density of 7.12 × 107 A m−2

 for 0–300 h. The results show that, due to the anisotropy of the Cu6Sn5 in the

absorption factor and the action of the electron wind, the [0001] directions of

the Cu6Sn5 grains at the anodic Sn|Cu6Sn5 interface gradually reorient toward

the current density vectors with the stress time, and certain original Cu6Sn5 

grains (termed normal grains) with unfavorable surface orientations are replaced

by newly generated grains (termed abnormal grains) with favorable surface

orientations. Consequently, the growth mode of the anodic Cu6Sn5 grains is

not invariable, and the corresponding transition process is conjectured to

transition from the reaction-controlled mode to the diffusion-controlled mode

in three stages. Finally, the anodic Cu6Sn5 grains, both normal and abnormal,

grow to assume elongated rod-type shapes and may further form a reliable

interconnection layer to improve the joint reliability.
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