Structural and physical properties of tin oxide thin films for optoelectronic applications
<Abstract>
Tin oxide films were deposited on glass substrates by RF magnetron sputtering.
At a lower sputtering pressure, the tin oxide film comprised nanocrystalline
orthorhombic SnO with a (110) orientation, greater p-type conductivity and better
hydrophobicity. Increasing substrate temperature resulted in the coexistence of
nanocrystalline orthorhombic SnO and tetragonal SnO2 in the deposited film,
favoring hydrophilicity, changing the p-type conductivity to n-type conductivity,
and reducing resistivity. As the sputtering pressure or substrate temperature
increased, the tin oxide film exhibited a lower surface roughness, a larger optical
energy gap, and higher optical transmission.
<全文連結>
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