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Structural and physical properties of tin oxide thin films for optoelectronic applications

<Abstract>

Tin oxide films were deposited on glass substrates by RF magnetron sputtering.

At a lower sputtering pressure, the tin oxide film comprised nanocrystalline

orthorhombic SnO with a (110) orientation, greater p-type conductivity and better

hydrophobicity. Increasing substrate temperature resulted in the coexistence of

nanocrystalline orthorhombic SnO and tetragonal SnO2 in the deposited film,

favoring hydrophilicity, changing the p-type conductivity to n-type conductivity,

and reducing resistivity. As the sputtering pressure or substrate temperature

increased, the tin oxide film exhibited a lower surface roughness, a larger optical

energy gap, and higher optical transmission.
<全文連結>

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